Photonica

Multi-quantum well (MQW)

An active region consisting of multiple thin quantum-well layers separated by wider-bandgap barrier layers. The dominant gain medium architecture for modern telecom diode lasers.

A multi-quantum-well (MQW) active region stacks several quantum well layers separated by barrier layers of higher-bandgap material. Each well confines carriers in one dimension and contributes its own optical gain to the cavity mode. The barriers prevent quantum-mechanical coupling between adjacent wells while supplying carriers to all wells in parallel via classical drift and diffusion.

Typical MQW configurations:

Material systemWell thicknessBarrier thicknessNumber of wellsEmission wavelength
InGaAsP/InP5 – 10 nm5 – 15 nm5 – 101300 – 1600 nm
InGaAlAs/InP5 – 10 nm5 – 15 nm5 – 101300 – 1600 nm
AlGaAs/GaAs5 – 10 nm5 – 20 nm1 – 5750 – 870 nm
InGaAs/GaAs5 – 8 nm10 – 20 nm1 – 5900 – 1100 nm
InGaAs/InGaAsP strained5 – 8 nm10 – 20 nm4 – 81100 – 1300 nm

Advantages over bulk double-heterostructure (DH) active regions:

  • Lower threshold current density — quantized density of states concentrates carriers at energies near the gain peak rather than spreading across a broad band
  • Higher differential gain dg/dNdg/dN — increases modulation bandwidth and reduces frequency chirp
  • Tunable emission wavelength via well thickness — independent of material composition, enabling fine wavelength engineering
  • Strain engineering — biaxial strain in the wells reshapes the valence band structure, can reduce Auger recombination and the linewidth enhancement factor

Number of wells trades off:

  • Few wells (1 – 3): highest differential gain, narrowest linewidth, low confinement factor, requires careful optical design
  • Many wells (5 – 10): higher modal gain via larger confinement factor, used in DFB lasers requiring strong gain × length to overcome grating losses, but with diminishing returns due to non-uniform carrier injection

Compressively strained MQW designs (InGaAsP wells with lattice constant larger than the InP substrate) became standard in telecom DFB lasers because the strain-induced valence band restructuring reduces Auger and intervalence band absorption losses, particularly important at 1550 nm.